Semiconductor Substrate Defect Detection Equipment
Defect Detection Series
Facing the upstream raw material manufacturing enterprises and the midstream wafer manufacturing enterprises in the semiconductor industry chain, the independent developed optical bright and dark field detection system is used to detect the appearance defects of semiconductor raw materials, epitaxial wafers and patterned wafers.
Fast-speed
High-precision
Compatibility
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Product advantages:
- Applicable to a variety of wafers
Suitable for 4-8 inch wafers, substrates, epitaxial wafers and patterned wafers
- Can detect a variety of defects
Detect particles, pits, bumps, scratches, stains, cracks and other defects
- High resolution
System resolution: 1-10 μ m
- Fast detection speed
No pattern wafer: 180 seconds / wafer when the number of defects is less than 200
Sample display:
Sample 1
Sample 2
Sample 3
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