Facing the raw material production enterprises in the upstream of the semiconductor industry chain, the independently developed spectral confocal measurement system is used to detect the size and flatness of semiconductor raw and epitaxial wafers.
We use cookies to personalize content, ads, social media faeatures and to analyze our traffic. We also share information about your use of our site with our social media, advertising and analytics partners. If you choose "ACCEPT ALL", you consent to the use of all cookies.
Fast-spped
High-accuracy
Wide-scope
ask price
