Fully Automatic SiC Wafer Modification and Cutting Equipment
LUSD3310
The Fully Automatic SiC Wafer Modification and Cutting Equipment LUSD3310 uses multiple high-precision CCD vision cameras to automatically identify and locate 6-8 inch wafers with various die specifications. Combining custom ultrafast lasers with a precision motion platform for relative movement, it performs internal wafer modification (stealth dicing). A dedicated wafer splitter then completes full wafer dicing and die separation.
The Fully Automatic SiC Wafer Modification and Cutting Equipment LUSD3310 uses multiple high-precision CCD vision cameras to automatically identify and locate 6-8 inch wafers with various die specifications. Combining custom ultrafast lasers with a precision motion platform for relative movement, it performs internal wafer modification (stealth dicing). A dedicated wafer splitter then completes full wafer dicing and die separation.
The system features a self-developed dynamic focus compensation module combined with a high-precision air-bearing linear motion platform, achieving industry-leading quality in high-precision, high-consistency wafer processing.
Equipped with a standard-design black-box enclosed optical path for stealth dicing, it ensures stable laser beam transmission and energy output, providing excellent processing stability.
With proprietary cutting and vision software, the system offers highly customizable functional modules to meet specific industry needs.
Product Advantages
Certified by SEMI Semiconductor Industry Standards
Customizable vision and cutting software modules adaptable to various wafer types
Equipped with SEMI-standard automated wafer handling and inspection systems
Integrated with high-precision Dynamic Focus Compensation System (DFT) and Autofocus System
Achieves processing precision of ≤ ±3 microns, meeting advanced industry benchmarks
Supports 6-8 inch wafers with dynamic focus compensation, autofocus, and auto-alignment to meet diverse processing needs
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